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Table 2 Shear bond strength means and standard deviations for the different groups (n = 10)

From: HF etching of CAD/CAM materials: influence of HF concentration and etching time on shear bond strength

shear bond strength mean ± SD (Mpa)

etching time (s)

substrate

HF concentration

cement

0

5

15

30

60

VM

5%

PV5

6.9 ± 1.2A

7.0 ± 1.4A

7.6 ± 1.0A

8.3 ± 2.1A

7.2 ± 0.9A

VAF

3.1 ± 0.4A

7.2 ± 1.0B,C

7.5 ± 1.5B,C

8.0 ± 1.6B

6.0 ± 1.3C

RUN

4.7 ± 0.9A

8.4 ± 1.1B

9.1 ± 1.9B

8.0 ± 1.4B

8.9 ± 1.0B

VAS

3.2 ± 0.6A

5.2 ± 1.0B

4.0 ± 0.6A

3.9 ± 0.7A

3.8 ± 0.7A

9%

PV5

6.9 ± 1.2A

7.3 ± 1.5A

7.8 ± 0.9A

8.0 ± 1.0A

7.1 ± 0.9A

VAF

3.1 ± 0.4A

7.1 ± 1.4B

7.6 ± 1.5B,C

8.6 ± 1.6C

7.9 ± 1.5B,C

RUN

4.7 ± 0.9A

6.5 ± 0.6B

7.5 ± 0.6B,C

6.6 ± 1.2B

7.7 ± 1.5C

VAS

3.2 ± 0.6A,B

3.4 ± 0.5A,B

3.5 ± 0.6A,B

3.9 ± 0.8A

2.9 ± 0.7B

VE

5%

PV5

5.2 ± 0.8A

7.2 ± 1.1B

7.7 ± 1.3B

7.5 ± 1.2B

8.0 ± 1.2B

VAF

4.1 ± 0.9A

6.8 ± 0.9B

9.0 ± 2.5C

9.1 ± 1.9C

8.1 ± 1.3B,C

RUN

4.9 ± 0.7A

8.1 ± 0.7B

8.9 ± 0.6C

8.2 ± 0.9B,C

7.7 ± 0.8B

VAS

2.3 ± 0.5A

4.4 ± 0.9B

3.6 ± 0.7C

3.7 ± 0.7B,C

4.1 ± 0.9B,C

9%

PV5

5.2 ± 0.8A

7.1 ± 0.8B

7.4 ± 1.1B

7.3 ± 1.1B

7.5 ± 1.6B

VAF

4.1 ± 0.9A

7.2 ± 1.6B

8.2 ± 1.5B

7.9 ± 1.4B

7.6 ± 1.1B

RUN

4.9 ± 0.7A

6.5 ± 0.8B

7.7 ± 0.8C

7.5 ± 0.9C

7.4 ± 1.0C

VAS

2.3 ± 0.5A

3.4 ± 0.7B

3.8 ± 0.6B,C

4.2 ± 0.8C

4.0 ± 0.7B,C

EC

5%

PV5

1.8 ± 1.1A

6.1 ± 1.1B

6.1 ± 0.9B

8.1 ± 1.0C

8.6 ± 1.7C

VAF

2.1 ± 1.5A

7.2 ± 1.2B

7.4 ± 0.9B

7.3 ± 0.7B

7.8 ± 1.7B

RUN

5.9 ± 2.2A

8.3 ± 1.9B

8.5 ± 1.5B,C

8.1 ± 1.5B

10.1 ± 0.8C

VAS

3.7 ± 1.2A

5.2 ± 0.9B

5.0 ± 1.1B

4.9 ± 0.8B

4.9 ± 1.3B

9%

PV5

1.8 ± 1.1A

4.9 ± 1.3B

6.8 ± 1.2C

9.5 ± 1.3D

8.7 ± 1.3D

VAF

2.1 ± 1.5A

6.1 ± 1.4B

7.2 ± 0.8B

7.0 ± 1.3B

7.2 ± 1.4B

RUN

5.9 ± 2.2A

9.0 ± 2.2B

8.1 ± 2.1B

6.8 ± 1.0B

9.0 ± 1.3B

VAS

3.7 ± 1.2A

4.6 ± 0.6B

5.1 ± 0.8B

4.5 ± 0.5A,B

4.4 ± 0.6A,B

VS

5%

PV5

2.9 ± 0.6A

7.1 ± 1.4B

6.6 ± 1.4B

6.8 ± 1.4B

7.6 ± 1.4B

VAF

1.2 ± 0.7A

6.9 ± 1.5B

8.1 ± 1.2B,C

9.2 ± 1.8C

7.7 ± 1.5B

RUN

4.3 ± 2.0A

9.7 ± 0.8B

9.3 ± 1.2B

9.4 ± 0.6B

9.8 ± 1.3B

VAS

4.4 ± 0.8A

4.4 ± 1.0A

5.2 ± 1.2A

4.5 ± 0.8A

4.6 ± 1.1A

9%

PV5

2.9 ± 0.6A

6.2 ± 1.6B

6.2 ± 0.4B

6.4 ± 1.2B

7.1 ± 1.9B

VAF

1.2 ± 0.7A

7.5 ± 1.1B

7.5 ± 1.4B

8.1 ± 1.7B

8.2 ± 1.6B

RUN

4.3 ± 2.0A

8.6 ± 1.6B,C

8.4 ± 1.1B,C

7.8 ± 0.7B

9.3 ± 1.7C

VAS

4.4 ± 0.8A

5.0 ± 1.0A

4.5 ± 1.1A

5.1 ± 0.9A

4.5 ± 0.9A

  1. Statistical differences determined with one-way ANOVA between etching times are indicated with different superscript letters (horizontal comparison, p < 0.05). Statistical differences between substrate, HF concentration and cement type determined with three-way ANOVA within each etching time are provided at the bottom of the table, the ranking starts with the highest mean SBS values (p < 0.05)
  2. 0 s: VM = VE > EC=VS (p < 0.001) / RUN>PV5 > VAS > VAF (p < 0.001)
  3. 5 s: VS ≥ VM = EC=VE (p = 0.007) / RUN>VAF=PV5 > VAS (p < 0.001) / HF5 > HF9 (p = 0.005)
  4. 15 s: VE = VS=VM = EC (p = 0.471) / RUN>VAF > PV5 > VAS (p < 0.001) / HF5 > HF9 (p = 0.003)
  5. 30 s: EC=VS=VE = VM (p = 0.803) / VAF = RUN=PV5 > VAS (p < 0.001) / HF5 = HF9 (p = 0.117)
  6. 60 s: EC=VS > VE = VM (p < 0.001) / RUN>PV5 = VAF > VAS (p < 0.001) / HF5 = HF9 (p = 0.057)