Skip to main content

Advertisement

Table 2 Shear bond strength means and standard deviations for the different groups (n = 10)

From: HF etching of CAD/CAM materials: influence of HF concentration and etching time on shear bond strength

shear bond strength mean ± SD (Mpa) etching time (s)
substrate HF concentration cement 0 5 15 30 60
VM 5% PV5 6.9 ± 1.2A 7.0 ± 1.4A 7.6 ± 1.0A 8.3 ± 2.1A 7.2 ± 0.9A
VAF 3.1 ± 0.4A 7.2 ± 1.0B,C 7.5 ± 1.5B,C 8.0 ± 1.6B 6.0 ± 1.3C
RUN 4.7 ± 0.9A 8.4 ± 1.1B 9.1 ± 1.9B 8.0 ± 1.4B 8.9 ± 1.0B
VAS 3.2 ± 0.6A 5.2 ± 1.0B 4.0 ± 0.6A 3.9 ± 0.7A 3.8 ± 0.7A
9% PV5 6.9 ± 1.2A 7.3 ± 1.5A 7.8 ± 0.9A 8.0 ± 1.0A 7.1 ± 0.9A
VAF 3.1 ± 0.4A 7.1 ± 1.4B 7.6 ± 1.5B,C 8.6 ± 1.6C 7.9 ± 1.5B,C
RUN 4.7 ± 0.9A 6.5 ± 0.6B 7.5 ± 0.6B,C 6.6 ± 1.2B 7.7 ± 1.5C
VAS 3.2 ± 0.6A,B 3.4 ± 0.5A,B 3.5 ± 0.6A,B 3.9 ± 0.8A 2.9 ± 0.7B
VE 5% PV5 5.2 ± 0.8A 7.2 ± 1.1B 7.7 ± 1.3B 7.5 ± 1.2B 8.0 ± 1.2B
VAF 4.1 ± 0.9A 6.8 ± 0.9B 9.0 ± 2.5C 9.1 ± 1.9C 8.1 ± 1.3B,C
RUN 4.9 ± 0.7A 8.1 ± 0.7B 8.9 ± 0.6C 8.2 ± 0.9B,C 7.7 ± 0.8B
VAS 2.3 ± 0.5A 4.4 ± 0.9B 3.6 ± 0.7C 3.7 ± 0.7B,C 4.1 ± 0.9B,C
9% PV5 5.2 ± 0.8A 7.1 ± 0.8B 7.4 ± 1.1B 7.3 ± 1.1B 7.5 ± 1.6B
VAF 4.1 ± 0.9A 7.2 ± 1.6B 8.2 ± 1.5B 7.9 ± 1.4B 7.6 ± 1.1B
RUN 4.9 ± 0.7A 6.5 ± 0.8B 7.7 ± 0.8C 7.5 ± 0.9C 7.4 ± 1.0C
VAS 2.3 ± 0.5A 3.4 ± 0.7B 3.8 ± 0.6B,C 4.2 ± 0.8C 4.0 ± 0.7B,C
EC 5% PV5 1.8 ± 1.1A 6.1 ± 1.1B 6.1 ± 0.9B 8.1 ± 1.0C 8.6 ± 1.7C
VAF 2.1 ± 1.5A 7.2 ± 1.2B 7.4 ± 0.9B 7.3 ± 0.7B 7.8 ± 1.7B
RUN 5.9 ± 2.2A 8.3 ± 1.9B 8.5 ± 1.5B,C 8.1 ± 1.5B 10.1 ± 0.8C
VAS 3.7 ± 1.2A 5.2 ± 0.9B 5.0 ± 1.1B 4.9 ± 0.8B 4.9 ± 1.3B
9% PV5 1.8 ± 1.1A 4.9 ± 1.3B 6.8 ± 1.2C 9.5 ± 1.3D 8.7 ± 1.3D
VAF 2.1 ± 1.5A 6.1 ± 1.4B 7.2 ± 0.8B 7.0 ± 1.3B 7.2 ± 1.4B
RUN 5.9 ± 2.2A 9.0 ± 2.2B 8.1 ± 2.1B 6.8 ± 1.0B 9.0 ± 1.3B
VAS 3.7 ± 1.2A 4.6 ± 0.6B 5.1 ± 0.8B 4.5 ± 0.5A,B 4.4 ± 0.6A,B
VS 5% PV5 2.9 ± 0.6A 7.1 ± 1.4B 6.6 ± 1.4B 6.8 ± 1.4B 7.6 ± 1.4B
VAF 1.2 ± 0.7A 6.9 ± 1.5B 8.1 ± 1.2B,C 9.2 ± 1.8C 7.7 ± 1.5B
RUN 4.3 ± 2.0A 9.7 ± 0.8B 9.3 ± 1.2B 9.4 ± 0.6B 9.8 ± 1.3B
VAS 4.4 ± 0.8A 4.4 ± 1.0A 5.2 ± 1.2A 4.5 ± 0.8A 4.6 ± 1.1A
9% PV5 2.9 ± 0.6A 6.2 ± 1.6B 6.2 ± 0.4B 6.4 ± 1.2B 7.1 ± 1.9B
VAF 1.2 ± 0.7A 7.5 ± 1.1B 7.5 ± 1.4B 8.1 ± 1.7B 8.2 ± 1.6B
RUN 4.3 ± 2.0A 8.6 ± 1.6B,C 8.4 ± 1.1B,C 7.8 ± 0.7B 9.3 ± 1.7C
VAS 4.4 ± 0.8A 5.0 ± 1.0A 4.5 ± 1.1A 5.1 ± 0.9A 4.5 ± 0.9A
  1. Statistical differences determined with one-way ANOVA between etching times are indicated with different superscript letters (horizontal comparison, p < 0.05). Statistical differences between substrate, HF concentration and cement type determined with three-way ANOVA within each etching time are provided at the bottom of the table, the ranking starts with the highest mean SBS values (p < 0.05)
  2. 0 s: VM = VE > EC=VS (p < 0.001) / RUN>PV5 > VAS > VAF (p < 0.001)
  3. 5 s: VS ≥ VM = EC=VE (p = 0.007) / RUN>VAF=PV5 > VAS (p < 0.001) / HF5 > HF9 (p = 0.005)
  4. 15 s: VE = VS=VM = EC (p = 0.471) / RUN>VAF > PV5 > VAS (p < 0.001) / HF5 > HF9 (p = 0.003)
  5. 30 s: EC=VS=VE = VM (p = 0.803) / VAF = RUN=PV5 > VAS (p < 0.001) / HF5 = HF9 (p = 0.117)
  6. 60 s: EC=VS > VE = VM (p < 0.001) / RUN>PV5 = VAF > VAS (p < 0.001) / HF5 = HF9 (p = 0.057)